Please use this identifier to cite or link to this item: https://hdl.handle.net/20.500.14365/1501
Title: In Vacuo Porphyrin Metalation on Ag(111) via Chemical Vapor Deposition of Ru-3(CO)(12): Mechanistic Insights
Authors: Papageorgiou, Anthoula C.
Diller, Katharina
Fischer, Sybille
Allegretti, Francesco
Klappenberger, Florian
Oh, Seung Cheol
Saglam, Ozge
Keywords: Surface
Atoms
Iron
Publisher: Amer Chemical Soc
Abstract: Porphyrin molecules offer a very stable molecular environment for the incorporation of numerous metal ions inside their cavity, which enables a plethora of applications. The fabrication and characterization of surface confined metal organic architectures by employing porphyrins are of particular interest. Here, we report on a comprehensive study of chemical vapor deposition (CVD) of triruthenium dodecacarbonyl as metal precursor for the on-surface metalation of different porphyrin species with Ru under ultrahigh vacuum conditions. By employing synchrotron radiation X-ray photoelectron spectroscopy (XPS), near edge X-ray absorption fine structure (NEXAFS), and scanning tunneling microscopy (STM), we investigated the metalation process and particularly the role of the support: the close packed Ag(111) surface. It was found that the surface is active in the metalation process under the employed conditions: it decomposes the metal precursor and delivers metal centers to the porphyrin macrocycles. The generality of the metalation process is illustrated for tetraphenylporphyrin, its high temperature derivatives, and porphine.
URI: https://doi.org/10.1021/acs.jpcc.6b01457
https://hdl.handle.net/20.500.14365/1501
ISSN: 1932-7447
Appears in Collections:WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection

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