Please use this identifier to cite or link to this item: https://hdl.handle.net/20.500.14365/3659
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dc.contributor.authorGhasemi A.-
dc.contributor.authorHeavey C.-
dc.contributor.authorKabak K.E.-
dc.date.accessioned2023-06-16T15:01:53Z-
dc.date.available2023-06-16T15:01:53Z-
dc.date.issued2019-
dc.identifier.isbn9.78154E+12-
dc.identifier.issn0891-7736-
dc.identifier.urihttps://doi.org/10.1109/WSC.2018.8632204-
dc.identifier.urihttps://hdl.handle.net/20.500.14365/3659-
dc.descriptionArena;Bayer;Chalmers;et al.;Simio;The AnyLogic Companyen_US
dc.description2018 Winter Simulation Conference, WSC 2018 -- 9 December 2018 through 12 December 2018 -- 144832en_US
dc.description.abstractPhotolithography plays a key role in semiconductor manufacturing systems. In this paper, we address the capacity allocation problem in the photolithography area (CAPPA) subject to machine dedication and tool capability constraints. After proposing the mathematical model of the considered problem, we present a new genetic algorithm named RGA which was derived from a psychological concept called Reference Group in society. Finally, to evaluate the efficiency of the algorithm, we solve a real case study problem from a semiconductor manufacturing company in Ireland and compare the results with one of the genetic algorithms proposed in the literature. Results show the effectiveness and efficiency of RGA to solve CAPPA in a reasonable time. © 2018 IEEEen_US
dc.description.sponsorshipHorizon 2020 Framework Programme, H2020: 737459; Horizon 2020; Electro Medical Systems, EMS; Electronic Components and Systems for European Leadership, ECSELen_US
dc.description.sponsorshipThis project named Productive 4.0 has received funding from the Electronic Component Systems for European Leadership Joint Undertaking under grant agreement No 737459. This Joint Undertaking receives support from the European Union’s Horizon 2020 research and innovation program and Germany, Austria, France, Czech Republic, Netherlands, Belgium, Spain, Greece, Sweden, Italy, Ireland, Poland, Hungary, Portugal, Denmark, Finland, Luxembourg, Norway, Turkey.en_US
dc.description.sponsorshipThis project named Productive 4.0 has received funding from the Electronic Component Systems for European Leadership Joint Undertaking under grant agreement No 737459. This Joint Undertaking receives support from the European Union's Horizon 2020 research and innovation program and Germany, Austria, France, Czech Republic, Netherlands, Belgium, Spain, Greece, Sweden, Italy, Ireland, Poland, Hungary, Portugal, Denmark, Finland, Luxembourg, Norway, Turkey.en_US
dc.language.isoenen_US
dc.publisherInstitute of Electrical and Electronics Engineers Inc.en_US
dc.relation.ispartofProceedings - Winter Simulation Conferenceen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectEfficiencyen_US
dc.subjectGenetic algorithmsen_US
dc.subjectPhotolithographyen_US
dc.subjectCapacity allocationen_US
dc.subjectEffectiveness and efficienciesen_US
dc.subjectMachine dedicationen_US
dc.subjectNew genetic algorithmsen_US
dc.subjectReal caseen_US
dc.subjectReference groupen_US
dc.subjectSemiconductor manufacturingen_US
dc.subjectSemiconductor manufacturing systemsen_US
dc.subjectSemiconductor device manufactureen_US
dc.titleImplementing a new genetic algorithm to solve the capacity allocation problem in the photolithography areaen_US
dc.typeConference Objecten_US
dc.identifier.doi10.1109/WSC.2018.8632204-
dc.identifier.scopus2-s2.0-85062598473en_US
dc.authorscopusid57190121746-
dc.authorscopusid24587842500-
dc.identifier.volume2018-Decemberen_US
dc.identifier.startpage3696en_US
dc.identifier.endpage3707en_US
dc.identifier.wosWOS:000461414103080en_US
dc.relation.publicationcategoryKonferans Öğesi - Uluslararası - Kurum Öğretim Elemanıen_US
dc.identifier.scopusqualityQ4-
dc.identifier.wosqualityN/A-
item.grantfulltextreserved-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.cerifentitytypePublications-
item.openairetypeConference Object-
item.fulltextWith Fulltext-
item.languageiso639-1en-
Appears in Collections:Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection
WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection
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