Please use this identifier to cite or link to this item: https://hdl.handle.net/20.500.14365/5913
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dc.contributor.authorGördesli Duatepe, Fatma Pınar-
dc.contributor.authorKüçükcan, Begümnur-
dc.contributor.authorSağlam, Özge-
dc.date.accessioned2025-02-25T19:31:33Z-
dc.date.available2025-02-25T19:31:33Z-
dc.date.issued2025-
dc.identifier.issn2192-6506-
dc.identifier.urihttps://doi.org/10.1002/cplu.202400678-
dc.description.abstractAccurate determination of dielectric properties and surface characteristics of two-dimensional (2D) perovskite nanosheets, produced by chemical exfoliation of layered perovskites, is often hindered by exfoliation agent residues such as tetrabutylammonium (TBA). This study investigated the effect of ultraviolet (UV) light exposure duration on the removal of TBA residues from 2D Ca2NaNb4O13− nanosheets deposited on silicon substrates via Langmuir-Blodgett method using atomic force microscopy (AFM). Nanoscale adhesion forces between silicon AFM tips and nanofilms exposed to UV light for 3, 12, 18, and 24 hours were measured. Nanofilms exposed to UV for 12 hours showed significant heterogeneity in adhesion forces compared to control nanofilms not exposed to UV. This heterogeneity improved after 18 hours and reached maximum homogeneity at 24 hours. A noticeable decrease in adhesion forces indicated a reduction in TBA residues after 18 hours, with further reduction observed at 24 hours. The most probable adhesion forces for control nanofilms and those exposed to UV for 3 and 12 hours were 1.6-fold and 2.0-fold higher, respectively, compared to nanofilms exposed to UV for 18 and 24 hours. Similarly, surface roughness peaked at 12 hours and then decreased with longer exposure, resulting in a smoother surface at 24 hours. © 2025 The Author(s). ChemPlusChem published by Wiley-VCH GmbH.en_US
dc.description.sponsorshipKUYTAM; Koç University Surface Science and Technology Center; Türkiye Bilimsel ve Teknolojik Araştırma Kurumu, TÜBİTAK, (218M517); Türkiye Bilimsel ve Teknolojik Araştırma Kurumu, TÜBİTAKen_US
dc.language.isoenen_US
dc.publisherJohn Wiley and Sons Incen_US
dc.relation.ispartofChemPlusChemen_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.subjectAtomic Force Microscopyen_US
dc.subjectLangmuir-Blodgett Filmsen_US
dc.subjectNanostructuresen_US
dc.subjectPerovskitesen_US
dc.subjectSurface Analysisen_US
dc.titleEffect of Uv Light Exposure Duration on the Removal of Exfoliation Agent Residues in Two-Dimensional Perovskite Nanosheets: an Afm Studyen_US
dc.typeArticleen_US
dc.identifier.doi10.1002/cplu.202400678-
dc.identifier.pmid39878401-
dc.identifier.scopus2-s2.0-105001084077-
dc.departmentİzmir Ekonomi Üniversitesien_US
dc.authorscopusid54897974100-
dc.authorscopusid58168370500-
dc.authorscopusid55750645300-
dc.identifier.volume90en_US
dc.identifier.issue3en_US
dc.identifier.wosWOS:001413872900001-
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.identifier.scopusqualityQ2-
dc.identifier.wosqualityQ2-
dc.description.woscitationindexScience Citation Index Expanded-
item.fulltextWith Fulltext-
item.grantfulltextreserved-
item.cerifentitytypePublications-
item.openairecristypehttp://purl.org/coar/resource_type/c_18cf-
item.openairetypeArticle-
item.languageiso639-1en-
crisitem.author.dept05.08. Genetics and Bioengineering-
crisitem.author.dept05.10. Mechanical Engineering-
Appears in Collections:PubMed İndeksli Yayınlar Koleksiyonu / PubMed Indexed Publications Collection
Scopus İndeksli Yayınlar Koleksiyonu / Scopus Indexed Publications Collection
WoS İndeksli Yayınlar Koleksiyonu / WoS Indexed Publications Collection
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