Effect of Uv Light Exposure Duration on the Removal of Exfoliation Agent Residues in Two-Dimensional Perovskite Nanosheets: an Afm Study

Abstract

Accurate determination of dielectric properties and surface characteristics of two-dimensional (2D) perovskite nanosheets, produced by chemical exfoliation of layered perovskites, is often hindered by exfoliation agent residues such as tetrabutylammonium (TBA). This study investigated the effect of ultraviolet (UV) light exposure duration on the removal of TBA residues from 2D Ca2NaNb4O13- nanosheets deposited on silicon substrates via Langmuir-Blodgett method using atomic force microscopy (AFM). Nanoscale adhesion forces between silicon AFM tips and nanofilms exposed to UV light for 3, 12, 18, and 24 hours were measured. Nanofilms exposed to UV for 12 hours showed significant heterogeneity in adhesion forces compared to control nanofilms not exposed to UV. This heterogeneity improved after 18 hours and reached maximum homogeneity at 24 hours. A noticeable decrease in adhesion forces indicated a reduction in TBA residues after 18 hours, with further reduction observed at 24 hours. The most probable adhesion forces for control nanofilms and those exposed to UV for 3 and 12 hours were 1.6-fold and 2.0-fold higher, respectively, compared to nanofilms exposed to UV for 18 and 24 hours. Similarly, surface roughness peaked at 12 hours and then decreased with longer exposure, resulting in a smoother surface at 24 hours.